In this work, we present a nickel assisted electroless deposition and etching method for significant reduction of reflectivity of silicon by creating two-scale structured silicon surface. As the first step, the nano-texturization process was applied on planar Si wafers in order to optimize the process.
Next, we applied this method for silicon surface with chemically prepared pyramids in order to produce a hierarchical (micron/nano) structure. We found that silicon wafers with hierarchical structure shown very low about 2.2% weighted reflection over broad wavelength range from 300 to 1100 nm, which is related with changes in surface morphology.
Pranaitis, M., Jaraminė, L., Čyras, V., Selskis, A. and Galdikas, A., 2013. Antireflective structures on silicon surface using catalytic nickel nanoparticles. Journal of Applied Physics, 114(16), p.163523.
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